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Download Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) eBook

by W. N. G. Hitchon

Download Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) eBook
ISBN:
0521018005
Author:
W. N. G. Hitchon
Category:
Engineering
Language:
English
Publisher:
Cambridge University Press (September 29, 2005)
Pages:
232 pages
EPUB book:
1141 kb
FB2 book:
1528 kb
DJVU:
1134 kb
Other formats
lrf lit mobi txt
Rating:
4.1
Votes:
203


Plasma Processes for Semiconductor Fabrication. Advances in semiconductor technology have made possible the fabrication of structures whose dimensions are much smaller than the mean free path of an electron.

Plasma Processes for Semiconductor Fabrication. Published online: 01 October 2009. After an initial chapter covering fundamental concepts, the transmission function formalism is presented, and used to describe three key topics in mesoscopic physics: the quantum Hall effect; localisation; and double-barrier tunnelling.

Synopsis: Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched.

Price Comparison for Engineering Books. Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering).

Plasma processing is a central technique in the fabrication of semiconductor . No prior knowledge of plasma physics is assumed in the book.

Plasma processing is a central technique in the fabrication of semiconductor devices.

Автор: W. N. G. Hitchon Название: Plasma Processes for Semiconductor Fabrication Издательство .

No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.

A comprehensive and thorough treatment of doping in semi-conductors that examines both theoretical and experimental aspects and includes important material on delta-doping. Series: Cambridge Studies in Semiconductor Physics and Microelectronic Engineering (Book 1).

Series: Cambridge studies in semiconductor physics and microelectronic engineering, 8.

Full recovery of all data can take up to 2 weeks! So we came to the decision at this time to double the download limits for all users until the problem is completely resolved. Thanks for your understanding! Progress: 9. 1% restored. Главная Plasma processes for semiconductor fabrication. Plasma processes for semiconductor fabrication. Series: Cambridge studies in semiconductor physics and microelectronic engineering, 8. File: PDF, 1. 8 MB. Читать онлайн.

Microelectronic Engineering. Nanotechnology and Processing - Electronics, photonics, MEMS and Life Sciences.

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.
  • Prinna
reference only!
  • Ranenast
This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.