almediah.fr
» » Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology Series)

Download Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology Series) eBook

by John E.J. Schmitz

Download Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology Series) eBook
ISBN:
0815512880
Author:
John E.J. Schmitz
Category:
Engineering
Language:
English
Publisher:
William Andrew; 1 edition (January 14, 1993)
Pages:
251 pages
EPUB book:
1647 kb
FB2 book:
1609 kb
DJVU:
1171 kb
Other formats
mbr mobi txt rtf
Rating:
4.8
Votes:
793


Materials deposition chemistry, equipment, process technology, developments, and applications are .

Materials deposition chemistry, equipment, process technology, developments, and applications are described. The Blanket Tungsten Approach . Principal steps . Tungsten adhesion . Blanket deposition of tungsten . Etch back of blanket tungsten . Degree of planarization and the contact diameter . Blanket tungsten material characterization. The Selective Tungsten Approach . Types of substrates . Types of dielectric layers . Chemistry of selective tungsten . Mechanisms of selectivity loss . Electrical characterization.

Schnlitz, John EJ. Chemical ve. or deposition of tungsten and tungsten silicides for VLSI/ULSI applications . Additionally, it allowed the coverage of the SiH2Cl 2 based tungsten silicide process which is relatively new today. or deposition of tungsten and tungsten silicides for VLSI/ULSI applications, by John . Schmitz p. em. Includes bibliographical references and index. ISBN 0-8155-1288-0 1. Integrated circuits-Very large scale s. For the convenience of the reader a comprehensive reference list of over 260 references is included at the end of the book. The literature references are grouped according to their subject.

Materials deposition chemistry, equipment, process technology . Chemical Vapor Deposition of John . You can specify the type of files you want, for your device. Schmitz epub Chemical Vapor Deposition of John . Schmitz pdf Chemical Vapor Deposition of John . Schmitz pdf download Chemical Vapor Deposition of John . Schmitz summary Chemical Vapor Deposition of John . Schmitz textbooks Chemical Vapor Deposition of John .

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Materials deposition chemistry, equipment, process technology, developments, and applications are . Скачать с помощью Mediaget. com/Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications. Download from free file storage.

Theprinciple advantage of chemical vapor depositionof electronic materials over other methods is in stepcoverage, the absence of radiation damage,throughput and the possibility for selectivegrowth. 4 For example, CVD of WO3 occurs attemperatures significantly below those for evapora-tion (1300 C.

Chemical Vapor Deposition: Thermal and Plasma Deposition of Electronic Materials By Srinivasan Sivaram (auth. Chemical vapor transport reactions By Michael Binnewies, Robert Glaum, Marcus Schmidt, Peer Schmidt. Chemical Warfare By Edward M. Spiers (auth. Chemical Warfare By Curt S. Wachtel.

Tungsten and tungsten nitride layers have been deposited by. .

Tungsten and tungsten nitride layers have been deposited by plasma-enhanced chemical vapor deposition (PECVD). A deposition process was established for smooth amorphous tungsten-rich W x N layers at 150 °C. Keywords. Tungsten Fluorine Silicon Substrate Deposition Temperature Amorphous Layer. These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

No current Talk conversations about this book.

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/.

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.