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Download Metrology, Inspection & Process Control for Microlithography XI: 10-12 March 1997 Santa Clara, California (Proceedings of Spie) eBook

by Susan K. Jones

Download Metrology, Inspection & Process Control for Microlithography XI: 10-12 March 1997 Santa Clara, California (Proceedings of Spie) eBook
ISBN:
0819424641
Author:
Susan K. Jones
Category:
Engineering
Language:
English
Publisher:
Society of Photo Optical (July 1, 1997)
Pages:
636 pages
EPUB book:
1238 kb
FB2 book:
1331 kb
DJVU:
1388 kb
Other formats
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Rating:
4.4
Votes:
134


Metrology, Inspection & Process Control for Microlithography XI: 10-12 March 1997 Santa Clara, California (Proceedings of Spie, Vol. 3050). 0819424641 (ISBN13: 9780819424648). This book is not yet featured on Listopia.

Metrology, Inspection, and Process Control for Microlithography X. MICROLITHOGRAPHY '97. 10-14 March 1997.

MICROLITHOGRAPHY '97. Santa Clara, CA, United States. View the SPIE Conference + Exhibitions Calendar. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, pg 54 (7 July 1997); doi: 1. 117/12. Read Abstract +. Statistical metrology can be defined as a set of procedures to remove systematic and random gauge error from confounded measurement data for the purpose of reducing total uncertainty.

Article in Proceedings of SPIE - The International Society for Optical Engineering · April 2008 with 19 Reads. Strict overlay requirements are being driven not only by the process node but also the process techniques required to meet the design requirements. Cite this publication. Double patterning lithography and spacer pitch splitting techniques are driving innovative thinking with respect to overlay control. As lithographers push the current capabilities of their 193nm immersion exposure tools they are utilizing newly enabled control 'knobs'.

SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 1. Show Author Affiliations. Joseph C. Pellegrini, New Vision Systems, Inc. (United States).

SPIE Proceedings Metrology, Inspection, and Process Control for Microlithography XI - Method to characterize overlay tool misalignments and distortions Silver, Richard . Potzick, James . Scire, Fredric; Evans, Christopher . McGlauflin, . Kornegay, Edward; Larrabee, Robert . Jones, Susan K. download BookSC. Download books for free. Silver, Richard . download.

10-12 March, 1997, Santa Clara, California. Published 1997 by SPIE in Bellingham, Washington Proceedings, SPIE-the International Society for Optical Engineering ;, v. 3050, Proceedings of SPIE. Published 1997 by SPIE in Bellingham, Washington. Congresses, Measurement, Process control, Inspection, Microlithography, Integrated circuits. Includes bibliographic references and author index. Proceedings, SPIE-the International Society for Optical Engineering ;, v. 3050, Proceedings of SPIE-the International Society for Optical Engineering ;, v. 3050.

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Santa Clara, CA. Conference Title. Scanning Probe Metrology III. Pub Type.